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<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Article Authoring DTD v1.4 20240229//EN" "JATS-articleauthoring1.dtd">
<article article-type="research-article" xml:lang="zh-CN" xmlns:xlink="http://www.w3.org/1999/xlink">
  <front>
    <journal-meta>
      <journal-id journal-id-type="publisher-id">27</journal-id>
      <journal-title-group>
        <journal-title>《机械工程》</journal-title>
        <abbrev-journal-title>Mechanical engineering</abbrev-journal-title>
      </journal-title-group>
      <issn>ISSN：2661-3530(P)/2661-3549(O)</issn>
      <publisher>
        <publisher-name>环宇科学出版社;华文国际出版社</publisher-name>
      </publisher>
    </journal-meta>
    <article-meta>
      <article-id pub-id-type="publisher-id">8964</article-id>
      <title-group>
        <article-title>带侧壁积累型通道结构碳化硅沟槽栅 MOSFET SiC Trench MOSFET with Sidewall Accumulation Channel Structure</article-title>
      </title-group>
      <contrib-group>
        <contrib contrib-type="author">
          <string-name>支海朝 万玉喜* （深圳平湖实验室 广东深圳518100）</string-name>
        </contrib>
      </contrib-group>
      <pub-date pub-type="epub">
        <year>2024</year>
        <month>11</month>
      </pub-date>
      <issue>11</issue>
      <abstract>
        <p>本文设计了一种碳化硅沟槽栅控 MOSFET 及 IGBT 的新结构。通过外延回填工艺，获得 p-型侧壁较
薄的侧壁回填厚度。该侧壁回填厚度需要非常薄（针对一个本方案的特征例进行仿真，获得该厚度范围为</p>
      </abstract>
    </article-meta>
  </front>
</article>
